Key Technologies

High-Precision Nanoscale 3D Microstructure Fabrication Technology

Line-Illumination Temporal Focusing TPL (Line-TF TPL)

High-Precision Nanoscale 3D Microstructure Fabrication Technology

A:Creating Line Patterns

The femtosecond laser beam is directed onto a digital micromirror device (DMD), which acts as a precision mask, shaping the laser into programmable line patterns. Each mirror can be switched on/off independently, and the grayscale intensity can be controlled.

B:Spatiotemporal Focusing

The DMD disperses the different wavelengths of the femtosecond laser pulses in the time domain (femtosecond pulse stretching), while a cylindrical lens compresses the beam in the vertical direction (y-direction). When these femtosecond pulses recombine at the focal plane of the objective lens, they converge into a line.

C:Continuous Printing

The substrate moves smoothly beneath the focused line in a scanning motion, like a conveyor belt, while the DMD patterns change at a frequency of up to 13,000 times per second, precisely synchronized with the stage motion.

This technology achieves 1,600 levels of continuous grayscale adjustment from 10% to 100% intensity by precisely controlling the number of “on” pixels along the Y-axis via a DMD (digital micromirror device), and supports real-time dynamic updates at 13 kHz. Compared to other binary or computationally intensive holographic techniques, Line-TF TPL not only enables simultaneous fabrication of 75 nm nanowires and macroscopic structures within the same task, but also possesses near-isotropic axial resolution, extremely low computational overhead, and highly repeatable, stable printing performance.

A partial view of Along the River During the Qingming Festival printed by Astra Optics Limited’s LINESCAN 100i

Breakthrough Grayscale Lithography Technology

Traditional binary lithography

Only two states: on/off

Unable to achieve continuous intensity variation

Stepped surface with visible boundaries

LINE-TF Grayscale Lithography

  • 1,600 grayscale levels

  • Pixel-level precise control

  • Smooth continuous transition

Key Features

Sub-micron Fabrication Resolution

Arbitrary 3D Structure Control

Compatible with Various Photosensitive Materials

Enables 3D Structure Fabrication Without Multi-step Exposure

Application Scenarios

Biomedical Scaffolds

Optical Functional Structures

MEMS Devices (Micro-Electro-Mechanical Systems)

Line Scanning

The DMD-based temporal focusing technology enables parallel processing for two-photon line-illumination temporal focusing TPL.

Scanning two-photon lithography is a class of technologies that achieve three-dimensional nanomanufacturing through relative motion between the laser focus or pattern and the sample.

Line-TF TPL achieves true continuous 3D nanofabrication.Through full-bandwidth data streaming and pixel-level grayscale control, the printing throughput is increased by 12.7 times compared to traditional parallel techniques. This technology completely eliminates stitching defects and achieves sub-diffraction-limit precision with lateral 75 nm and axial 99 nm resolution over centimeter-scale areas, providing core driving force for industrial applications in micro-optics, metamaterials, and biomedicine.

Core Advantages

Reduces Micron-Level Misalignment Errors and Enhances Precision Consistency

Enables Geometric Integration of Multi-Structure and Multi-Material Designs

Can Be Integrated with LINESCAN 100i Technology to Improve the Success Rate of Complex Structures

Simplifies Path Calculation, Reducing Failure Rates and Calibration Costs

Application Scenarios

Multi-layer Microstructure Printing Tasks

Structural Alignment Control for Optoelectronic Devices

Hierarchical Alignment of Bioinspired Structures

Fabrication of Planar Microarrays or Gradient Structures

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