UV SCAN 100

Glovebox-Compatible Laser Direct Writing System

The system can be used for high-precision patterning of micro- and nano-structures, achieving sub-micron resolution and high-precision positioning capabilities. It combines large-area patterning capability with sub-micron accuracy. Applications include the research and development of optoelectronic devices such as micro-display chips, as well as testing scenarios involving atmosphere-sensitive materials like perovskites. Its ultra-compact form factor enables use within a glovebox under controlled atmospheric conditions.

Astra Optics UV SCAN 100 Direct-Write System

Core Technology：
Maskless Laser Direct Writing

Graphic Design and Processing

Using dedicated software for micro-nano structure design, the system automatically converts pattern data into control commands to streamline the printing process.

Beam Modulation and Focusing

The UV laser beam, modulated by a synergistic AOM and high-precision galvanometer system, is precisely focused onto the photoresist surface through a high-NA objective lens to ensure superior exposure quality.

High-speed high-precision

The laser beam executes high-speed, high-precision point-by-point scanning exposure along the predefined path, delivering stable sub-micron resolution control.

Ultra-compact design

With its compact design, the system can be readily integrated into a glovebox, ensuring stable performance under controlled ambient conditions to support the development and testing of sensitive materials like perovskites.

Unique Advantage

Supports Functional Customization

Cost-Effective /High localization ratio

Portable device; Glovebox-Compatible

UV SCAN 100

Advantage 1: Ultra-High Precision, Excellent Quality

High-End Hardware, Highly Localized: The system integrates domestically produced high-performance optical components, a proprietary precision optical system, and a nanometer-precision motion stage — together establishing an unparalleled foundation for precision and reliability.

Ultimate precision: minimum linewidth down to 0.25 μm, approaching the physical diffraction limit.

Core Advantage 2: Flexible and Agile for Rapid Iteration

Maskless digital workflow： No expensive physical masks required; design changes are made by simply updating digital files.

Rapid prototyping ：Flexibly adapts to complex circuits and fine micro/nano structures alike, enabling fast conversion from concept to prototype, significantly reducing R&D cycle time and costs.

Core Advantage 3: Easy Operation, Smart and Efficient

Efficient parameter screening ：Supports gradient power and focus offset exposure parameter arrays, enabling rapid identification of optimal process parameters in a single exposure.

One-click automation ： Integrates one-click loading, auto-focus, auto-alignment, and auto-exposure, significantly boosting printing efficiency and reducing maintenance costs.

User-friendly interface：Clear and intuitive operation logic minimizes the learning curve.

System Parameters

The UV SCAN 100 delivers exceptional resolution and manufacturing efficiency. Its key performance parameters and application areas are outlined below.

规格对比表
Application Two-Photon Polymerization (TPP) Printing Technology
Minimum Feature Size (XY) 250 nm
Minimum Equally Spaced Line Grid 560 nm
Writing Rate 18 mm²/h
Exposure Area ≥ 0.25 mm² x 0.25 mm² (single processing range, supports stitching for larger patterns)
Stitching Error Between Adjacent Exposure ≤ 150 nm
规格对比表
XY Stage Bidirectional Repeatability ≤ 120 nm
Minimum Step Size ≤ 50 nm
Printing Range (XY) 48 x 48 mm²
Substrate Type Microscope slides / wafers
Substrate Thickness 0 - 4.5 mm
Sample Size 5 x 5 mm² to 48 x 48 mm² (customizable)
Vibration Isolation (Optional) Platform Dimensions ≥ 400 × 30 mm; Bandwidth 1–200 Hz; Efficiency >90% @ 5 Hz, 90%–99% @ 10 Hz
Light Source 405 nm
Length x Width x Height(lithography unit only) 463 x 160 x 535 mm³
Weight (lithography unit only) 12 kg(backpack-grade)
Power Supply 230 VAC ±5 %, 50/60 Hz, 16 A
*Astra Optics Limited follows a policy of continuous product improvement. Specifications are subject to change without notice. Astra Optics Limited offers a limited warranty for all UV-SCAN 100 systems. For full details of this warranty coverage, please contact your local sales or service representa

Typical Application Scenarios

Micro-nano material and device prototyping

Suitable for high-resolution patterning of quantum dots, functional thin films, microelectrodes, and micro-nano optoelectronic device samples.

Micro-Optics and Diffractive Functional Structures

Suitable for high-precision fabrication of diffractive optical elements (DOE), periodic/aperiodic microstructures, functional surface textures, and micro-optical prototypes.

Rapid prototyping and process validation for research samples

Designed for universities, research institutes, and corporate R&D departments, supporting rapid fabrication, parameter optimization, and experimental validation of micro-nano structure samples.